Ken Shirriff on Nostr: The problem is that the chip manufacturing process uses plasma to etch away unwanted ...
The problem is that the chip manufacturing process uses plasma to etch away unwanted metal to produce wiring. However, long wires on the chip can pick up electrical charge from the plasma. This charge can damage the chip's transistors. In particular, each transistor has a thin layer of "gate oxide", just a few hundred atoms thick, that can easily be damaged. 2/6
Published at
2024-11-23 20:34:28Event JSON
{
"id": "7b848f3660253810d1bb580c654839e055189a4420ce72651c05f07452770347",
"pubkey": "53c85f49d60bd50b1b1366c2fa65054089988f695534d0b64a9b8d6b4e0ce45d",
"created_at": 1732394068,
"kind": 1,
"tags": [
[
"e",
"b5c348e94c6d040f61cf263d3177ffbe03dec692ba223f267c2eb36a0e0187eb",
"wss://relay.mostr.pub",
"reply"
],
[
"imeta",
"url https://assets.oldbytes.space/assets.oldbytes.space/media_attachments/files/113/534/165/523/356/108/original/e5e2049096b5e6b4.jpg",
"m image/jpeg",
"dim 1689x976",
"blurhash UqPjJLt6?vW-$-tSW-Vu?dW,IBniXQM{nib;"
],
[
"proxy",
"https://oldbytes.space/users/kenshirriff/statuses/113534177681411222",
"activitypub"
]
],
"content": "The problem is that the chip manufacturing process uses plasma to etch away unwanted metal to produce wiring. However, long wires on the chip can pick up electrical charge from the plasma. This charge can damage the chip's transistors. In particular, each transistor has a thin layer of \"gate oxide\", just a few hundred atoms thick, that can easily be damaged. 2/6\n\nhttps://assets.oldbytes.space/assets.oldbytes.space/media_attachments/files/113/534/165/523/356/108/original/e5e2049096b5e6b4.jpg",
"sig": "b97d89e3071d8ceaa9b3928b76c63277f85ee748c9b3e6578226ba1d5e84ef23263f1a02891305986396908a735068770e2be4c0877f521af65bbc316d8b5752"
}